发明名称 METHOD FOR DRAWING PATTERN AND PATTERN DRAWING APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for drawing a pattern and a pattern drawing apparatus by which middle-level light quantity can be used without using the middle voltage to be applied on each micromirror for control. <P>SOLUTION: As the pattern on a mirror device 106 is controlled in 10,000 Hz frame number in the pattern drawing apparatus, a new pattern is projected onto a mask substrate 108 at every 0.1 ms. The patterns are projected while the position of the projected pattern 109 is shifted (successively from 109a, 109b, 109c, 109d, 109e) at every 0.1 ms. That is, the pattern projected onto an enlarged mask 110 is shifted by 1/4 of the size (the width in the X direction) of the projected pattern by generating pulse laser light L1. The projected patterns in two frames overlap in 3/4 of the area and the entire area of the projected patterns overlap four times, this means four-step gradation can be produced. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2004354415(A) 申请公布日期 2004.12.16
申请号 JP20030148362 申请日期 2003.05.26
申请人 OMI TADAHIRO;BALL SEMICONDUCTOR INC 发明人 OMI TADAHIRO;SUGAWA SHIGETOSHI;YANAGIDA KIMIO;TAKEHISA KIWAMU
分类号 G03F1/68;G03F1/76;G03F7/20;H01L21/027;(IPC1-7):G03F7/20;G03F1/08 主分类号 G03F1/68
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