发明名称 Laminated structure and method of manufacturing the same
摘要 A laminated structure in which interconnections can be easily formed for electrodes and in which the damage of an insulating layer attributed to stress is relieved. The laminated structure includes a laminated piece having a first electrode layer provided with a first insulating region, a piezoelectric material layer, and a second electrode layer provided with a second insulating region at a position different from that of the first insulating region, a first interconnection line electrically connected to the first electrode layer while passing through the second insulating region provided in the second electrode layer, and a second interconnection line electrically connected to the second electrode layer while passing through the first insulating region provided in the first electrode layer.
申请公布号 US2004251784(A1) 申请公布日期 2004.12.16
申请号 US20040846588 申请日期 2004.05.17
申请人 FUJI PHOTO FILM CO., LTD. 发明人 KUNIYASU TOSHIAKI
分类号 H04R17/00;B06B1/06;H01L27/20;H01L41/047;H01L41/083;H01L41/09;H01L41/187;H01L41/22;H01L41/24;(IPC1-7):H01L41/083 主分类号 H04R17/00
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