发明名称 |
MONITORING MATERIAL BUILDUP ON SYSTEM COMPONENTS BY OPTICAL EMISSION |
摘要 |
A method and system are provided for monitoring material buildup on system components in a plasma processing system. The system components contain emitters that are capable of producing characteristic fluorescent light emission when exposed to a plasma. The method utilizes optical emission to monitor fluorescent light emission from the emitters for determining system component status. The method can evaluate material buildup on system components in a plasma, by monitoring fluorescent light emission from the emitters. Consumable system components that can be monitored using the method include rings, shields, electrodes, baffles, and liners. |
申请公布号 |
WO2004061899(A3) |
申请公布日期 |
2004.12.16 |
申请号 |
WO2003US39109 |
申请日期 |
2003.12.24 |
申请人 |
TOKYO ELECTRON LIMITED;LUDVIKSSON, AUDUNN;STRANG, ERIC, J. |
发明人 |
LUDVIKSSON, AUDUNN;STRANG, ERIC, J. |
分类号 |
G01N21/64;G01N21/68 |
主分类号 |
G01N21/64 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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