SUBSTRATE PROCESSOR

摘要

PROBLEM TO BE SOLVED: To provide a substrate processor in which processing liquid and gas are efficiently mixed and droplets of processing liquid are generated. SOLUTION: The substrate processor is provided with a two fluid nozzle 2. A liquid discharge port and a gas discharge port 36 arranged circularly around the port are formed in the two fluid nozzle 2. When demineralized water as processing liquid and nitrogen gas are introduced to the two fluid nozzle 2, demineralized water and nitrogen gas are discharged from the liquid discharge port and the gas discharge port 36. Demineralized water and nitrogen gas are mixed and the droplets of demineralized water are generated. The two fluid nozzle 2 is constituted in such a way that gas discharged from the gas discharge port 36 forms swirl air current surrounding processing liquid flow. COPYRIGHT: (C)2005,JPO&NCIPI