发明名称 Method for manufacturing gallium nitride (GaN) based single crystalline substrate
摘要 Disclosed is a method for manufacturing a gallium nitride (GaN)-based single crystalline substrate comprising the steps of (a) forming a GaN-based single crystalline bulk on an upper surface of a growth substrate; (b) forming grooves through the growth substrate so that the growth substrate is patterned and divided into several units by the grooves, each of the grooves having a designated width; and (c) separating the GaN-based single crystalline bulk from the growth substrate by irradiating a laser beam on a lower surface of the growth substrate.
申请公布号 US2004253796(A1) 申请公布日期 2004.12.16
申请号 US20030622466 申请日期 2003.07.21
申请人 NA JEONG SEOK;YOO SEUNG JIN;PARK YOUNG HO 发明人 NA JEONG SEOK;YOO SEUNG JIN;PARK YOUNG HO
分类号 C30B29/38;C23C16/34;C30B25/02;C30B33/00;H01L21/20;(IPC1-7):H01L21/00;C30B1/00;H01L21/36 主分类号 C30B29/38
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