发明名称 PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE LITHOGRAPHY PLATE AND METHOD FOR PRODUCING LITHOGRAPHY PLATE
摘要 <p>A photosensitive composition containing a compound having a radical polymerizable group (A), a compound having a cationically polymerizable group (B), a photopolymerization initiator (C) and a binder (D) is characterized in that an iron arene complex compound and a compound containing a halogenated alkyl group are contained as the photopolymerization initiator (C).</p>
申请公布号 WO2004109402(A1) 申请公布日期 2004.12.16
申请号 WO2004JP07861 申请日期 2004.05.31
申请人 KONICA MINOLTA MEDICAL & GRAPHIC, INC.;MATSUMURA, TOSHIYUKI;MIURA, NORIO 发明人 MATSUMURA, TOSHIYUKI;MIURA, NORIO
分类号 C08F20/28;C08G59/70;G03F7/00;G03F7/027;G03F7/029;G03F7/038;(IPC1-7):G03F7/027;G03F7/028;G03F7/004 主分类号 C08F20/28
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