发明名称 |
PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE LITHOGRAPHY PLATE AND METHOD FOR PRODUCING LITHOGRAPHY PLATE |
摘要 |
<p>A photosensitive composition containing a compound having a radical polymerizable group (A), a compound having a cationically polymerizable group (B), a photopolymerization initiator (C) and a binder (D) is characterized in that an iron arene complex compound and a compound containing a halogenated alkyl group are contained as the photopolymerization initiator (C).</p> |
申请公布号 |
WO2004109402(A1) |
申请公布日期 |
2004.12.16 |
申请号 |
WO2004JP07861 |
申请日期 |
2004.05.31 |
申请人 |
KONICA MINOLTA MEDICAL & GRAPHIC, INC.;MATSUMURA, TOSHIYUKI;MIURA, NORIO |
发明人 |
MATSUMURA, TOSHIYUKI;MIURA, NORIO |
分类号 |
C08F20/28;C08G59/70;G03F7/00;G03F7/027;G03F7/029;G03F7/038;(IPC1-7):G03F7/027;G03F7/028;G03F7/004 |
主分类号 |
C08F20/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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