| 摘要 |
In an attempt to manufacture a diffraction optical element having a sharp shape, like a perpendicular sidewall, using an exposure apparatus, lowering of the resolving power by defocusing, etc. would deteriorate the perpendicular sidewall shape into a taper shape, and result in a large taper shape. Accordingly, the exposure apparatus arranges an imaging position of a projection optical system near the resist surface, and makes a pitch of dot patterns on a mask constant. <IMAGE> |
