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发明名称
Methods for forming vias and trenches with controlled SiC etch rate and selectivity
摘要
申请公布号
EP1351290(A3)
申请公布日期
2004.12.15
申请号
EP20030100705
申请日期
2003.03.19
申请人
TEXAS INSTRUMENTS INCORPORATED
发明人
JIANG, PING;KRAFT, ROB;NEWTON, KENNETH JOSEPH
分类号
H01L21/3065;H01L21/311;H01L21/768;(IPC1-7):H01L21/768
主分类号
H01L21/3065
代理机构
代理人
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