| 摘要 |
<p>A near-field, interferometric optical microscopy system includes: a beam splitter positioned to separate an input beam into a measurement beam and a reference beam; a mask positioned to receive the measurement beam, the mask comprising at least one aperture having a dimension smaller than the wavelength of the input beam, wherein the mask aperture is configured to couple at least a portion of the measurement beam to a sample to define a near-field probe beam, the sample interacting with the near-field probe beam to define a near-field signal beam; a detector having an element responsive to optical energy; and optics positioned to direct at least a portion of the reference beam and at least a portion of the near-field signal beam to interfere at the detector element.</p> |
