发明名称 A movable stage system for in a lithographic projection apparatus, lithographic projection apparatus and device manufacturing method
摘要 <p>A movable stage system (10) for in a lithographic projection apparatus (1), at least comprising: a base (12); a platform (11) movable with respect to the base; a balance mass object (13,14) movable with respect to the base, for compensating forces generated by movements of the platform; and a drive mechanism (15-19) arranged for moving the platform and the balance mass objects with respect to the base; which drive mechanism comprises: at least one belt transmission (15-17,151-152) which couples said platform and said balance mass object, such that when said platform is moved in a moving direction (20), the balance mass object is moved in an at least partially opposite moving direction (21,22); and a driving device (19) which mechanically engages on at least one of the balance mass object or the platform, for directly driving the platform and the balance mass object. &lt;IMAGE&gt;</p>
申请公布号 EP1486824(A1) 申请公布日期 2004.12.15
申请号 EP20030076811 申请日期 2003.06.11
申请人 ASML NETHERLANDS B.V. 发明人
分类号 G03F7/20;H01L21/027;H01L21/68;(IPC1-7):G03F7/20 主分类号 G03F7/20
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