发明名称 |
Semiconductor device with semiconductor chip formed by using wide gap semiconductor as base material |
摘要 |
A switching chip (101) using silicon as the base material is located on the upper surface of a cooling mechanism formed of a heat sink (115), an insulating substrate (114) and a conductive plate (108), with a first conductive layer (109A) sandwiched in between. Further, a diode chip (102) having a smaller area than a cathode electrode (103) and using a wide gap semiconductor as the base material is located on the cathode electrode (103) which has a smaller area than an anode electrode (105), with a second conductive layer (109B) sandwiched in between. A closed container (117) encloses every structural component except an exposed portion of a bottom surface (115BS) in the interior space.
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申请公布号 |
US6831351(B2) |
申请公布日期 |
2004.12.14 |
申请号 |
US20020208980 |
申请日期 |
2002.08.01 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
HIRAO MASAYOSHI;SATOU KATSUMI;TOOI SHIGEO;MATSUO KAZUSHIGE |
分类号 |
H01L23/34;H01L21/52;H01L23/051;H01L23/36;H01L25/07;H01L25/18;(IPC1-7):H01L29/06 |
主分类号 |
H01L23/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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