| 摘要 |
The present invention provides a pattern defect inspecting apparatus wherein an amount-of-light monitor unit detects a variation in the amount of ultraviolet laser light during inspection to thereby determine the presence or absence of an influence thereof exerted on the inspection and detects the prediction of the life of a light source and a malfunction thereof, and the interior of an optical system is cleaned up to thereby ensure the prolongation of the life of each optical part and long-term reliability thereof, and a method thereof.
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