CLEANING APPARATUS FOR CLEANING CHEMICALS ON SURFACE OF WAFER

摘要

PURPOSE: A cleaning apparatus for cleaning chemicals on a surface of a wafer is provided to prevent the chemicals from remaining on the wafer after a wafer cleaning process by using plural spiral roller brushes. CONSTITUTION: The first and the second spiral roller brushes(130,140) are positioned at both sides of a wafer and come in contact with a front side and a rear side of the wafer, respectively. The first and the second rotary shafts(110,120) are connected to the first and the second spiral roller brushes. A driving unit provides the rotatory power to rotate the first and the second spiral roller brushes.