发明名称 |
REFERENCE MARK POSITION MEASUREMENT APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To decrease the period from starting to measure a reference mark until conveying a substrate to the executing position of the succeeding process without decreasing the measurement accuracy of position of the reference mark of the substrate in a reference mark locating apparatus. SOLUTION: While a substrate mount 15 is carried by a carrying part 20 in the carrying direction (shown as an arrow Y in the figure) and a camera 30 is moved by a diagonal scanning part 35 in the diagonal scanning direction (shown as an arrow J), the reference mark 11 of the substrate 10 is measured in the transverse direction (shown as an arrow X) via the camera 30 to acquire the position data indicating the position of the reference mark 11 in the transverse direction by a position data acquiring part 40. Then the reference position data indicating the graduations 26 of a reference scale 25 in the transverse direction is acquired by a reference position data acquiring part 45 in the same procedure as above described. The position data of the reference mark are corrected into the position data on the basis of the graduations of the reference scale based on the above reference position data. COPYRIGHT: (C)2005,JPO&NCIPI
|
申请公布号 |
JP2004348045(A) |
申请公布日期 |
2004.12.09 |
申请号 |
JP20030147655 |
申请日期 |
2003.05.26 |
申请人 |
FUJI PHOTO FILM CO LTD |
发明人 |
FUKUI TAKASHI;KAMIMURA HIROSHI;KAGAMI TAMITO |
分类号 |
G03F9/00;G03F7/20;H05K3/00;(IPC1-7):G03F9/00 |
主分类号 |
G03F9/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|