发明名称 COMPOSITIONS SUITABLE FOR REMOVING PHOTORESIST, PHOTORESIST BYPRODUCTS AND ETCHING RESIDUE, AND USE THEREOF
摘要 <p>Compositions containing certain amines and/or quaternary ammonium compounds, hydroxylamine, corrosion inhibitor, organic diluent and optionally water are capable of removing photoresist, photoresist byproducts and residue and etching residues from a substrate.</p>
申请公布号 WO2004107056(A1) 申请公布日期 2004.12.09
申请号 WO2004US16270 申请日期 2004.05.24
申请人 AIR PRODUCTS AND CHEMICALS, INC.;RIEKER, JENNIFER, M.;WIEDER, THOMAS;DURHAM, DANA, L. 发明人 RIEKER, JENNIFER, M.;WIEDER, THOMAS;DURHAM, DANA, L.
分类号 B08B3/14;B08B7/00;C11D9/00;G03F7/26;G03F7/30;G03F7/32;G03F7/42;H01L21/306;H01L21/311;H01L21/3213;(IPC1-7):G03F7/26 主分类号 B08B3/14
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