发明名称 APPARATUS FOR MIXING GASES USED FOR SEMICONDUCTOR FABRICATION PROCESS
摘要 PURPOSE: An apparatus for mixing gases used for a semiconductor fabrication process is provided to inspect periodically contamination of a bowl by forming an inspection window on a sidewall of the bowl for mixing the process gases. CONSTITUTION: A bowl(210) is used for providing a predetermined space to mix a plurality of process gases. A plurality of first process gas supply tubes(220) are connected to the bowl in order to process the plural process gases to the predetermined space of the bowl. The second process gas supply tube(222) is used for supplying the mixed gases of the bowl to a process chamber. An inspection window(230) is installed on a sidewall on the bowl in order to observe the inside of the bowl.
申请公布号 KR20040103645(A) 申请公布日期 2004.12.09
申请号 KR20030034699 申请日期 2003.05.30
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHOI, YONG TAE
分类号 H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/02
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