| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist material suitable as a positive resist, in particular, a chemically amplifying positive resist material having high sensitivity, high resolution, exposure latitude and process adaptability superior to a conventional positive resist material, showing a preferable pattern form after exposure, and having a wide baking temperature range. <P>SOLUTION: The material contains a polymer compound containing a repeating unit expressed by formula (1) and having 1,000 to 500,000 weight average molecular weight. In formula (1), R<SP>1</SP>represents H, OH, an alkyl group, a halogen atom or a trifluoromethyl group, R<SP>2</SP>represents H, OH, a halogen atom or a trifluoromethyl group, Y represents a methyl group, an ethyl group, or a propyl group, and n represents 0 or a positive integer 1 to 4. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
