| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing a semiconductor which suppresses an influence to a collet. SOLUTION: A guide rail 31 is provided at a first Z-axis slider 21 vertically driven by a Z-axis driver. The guide of the guide rail 31 is formed in a sectional crest shape, and an extending surface extended in a lengthwise direction, a first oblique surface and a second oblique surface are formed. A first cam follower rolling along the first oblique surface of the guide, a second cam follower rolling along the second oblique surface, and a third cam follower rolling along the extended surface, are provided on a second Z-axis slider 51. A support 52 is constructed by the respective cam followers. A Y-axis driver 65 for driving the second Z-axis slider 51 in a Y direction is provided, and the collet 3 for sucking a tip 2 is provided at the second Z-axis slider 51. COPYRIGHT: (C)2005,JPO&NCIPI
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