发明名称 Organic compounds for cvd raw material and process for producing thin film of metal or metal compound with the use of organic compound
摘要 The present invention provides an organic compound for CVD raw material prepared by mixing a first organometallic compound and at least one second organometallic compound, said first organometallic compound having a central metal atom and at least one ligand coordinated thereto and said second organic compound having the same central metal as that of the first organometallic compound and at least one different ligand coordinated thereto from the ligand of the first organometallic compound, wherein the first and second organometallic compounds differ in decomposition behavior. In particular, a CVD raw material having both easy handling and good adhesiveness to thin film, which have not been so far sufficiently compatible with each other, can be obtained by mixing a cyclopentadienyl complex or a derivative thereof as the first organometallic compound, and a beta-diketonato compound as the second organometallic compound.
申请公布号 US2004247911(A1) 申请公布日期 2004.12.09
申请号 US20040491825 申请日期 2004.04.06
申请人 SAITO MASAYUKI 发明人 SAITO MASAYUKI
分类号 C07C49/92;C07F1/10;C07F1/12;C07F15/00;C07F17/00;C07F17/02;C23C16/18;C23C16/448;(IPC1-7):H01B1/12 主分类号 C07C49/92
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