发明名称 |
WAFER TREATMENT SYSTEM HAVING LOAD LOCK AND BUFFER |
摘要 |
A transfer system for use with a tool for treating a work-piece at sub-atmospheric pressure such as an ion implanter for implanting silicon wafers. An enclosure defines a low pressure region for treatment of work-pieces placed at a work-piece treatment station within the low pressure region. Multiple work-piece isolation load locks transfer work-pieces, one or two at a time, from a higher pressure region to the lower pressure for treatment and back to said higher pressure subsequent to said treatment. A first robot transfers work-pieces within the low pressure region from the load locks to a treatment station within the low pressure region. Multiple other robots positioned outside the low pressure region transfers work-pieces to and from the multiple work-piece isolation load locks from a source of said work-pieces prior to treatment and to a destination of said work-pieces after said treatment. |
申请公布号 |
WO2004107412(A2) |
申请公布日期 |
2004.12.09 |
申请号 |
WO2004US16074 |
申请日期 |
2004.05.21 |
申请人 |
AXCELIS TECHNOLOGIES INC.;MITCHELL, ROBERT;WEED, ALLAN;GUELER, RICHARD |
发明人 |
MITCHELL, ROBERT;WEED, ALLAN;GUELER, RICHARD |
分类号 |
B65G49/07;H01L21/00;H01L21/677 |
主分类号 |
B65G49/07 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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