发明名称 HIGH-DENSITY PLASMA SOURCE
摘要 A plasma source including a cathode assembly having an inner cathode section and an outer cathode section. An anode is positioned adjacent to the outer cathode section so as to form a gap there between. A first power supply generates a first electric field across the gap between the anode and the outer cathode section. The first electric field ionizes a volume of feed gas that is located in the gap, thereby generating an initial plasma. A second power supply generates a second electric field proximate to the inner cathode section. The second electric field super-ionizes the initial plasma to generate a plasma comprising a higher density of ions than the initial plasma.
申请公布号 WO2004095497(A3) 申请公布日期 2004.12.09
申请号 WO2004US10724 申请日期 2004.04.07
申请人 ZOND, INC.;CHISTYAKOV, ROMAN 发明人 CHISTYAKOV, ROMAN
分类号 H01J37/32;H01J37/34 主分类号 H01J37/32
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