发明名称 |
HIGH-DENSITY PLASMA SOURCE |
摘要 |
A plasma source including a cathode assembly having an inner cathode section and an outer cathode section. An anode is positioned adjacent to the outer cathode section so as to form a gap there between. A first power supply generates a first electric field across the gap between the anode and the outer cathode section. The first electric field ionizes a volume of feed gas that is located in the gap, thereby generating an initial plasma. A second power supply generates a second electric field proximate to the inner cathode section. The second electric field super-ionizes the initial plasma to generate a plasma comprising a higher density of ions than the initial plasma. |
申请公布号 |
WO2004095497(A3) |
申请公布日期 |
2004.12.09 |
申请号 |
WO2004US10724 |
申请日期 |
2004.04.07 |
申请人 |
ZOND, INC.;CHISTYAKOV, ROMAN |
发明人 |
CHISTYAKOV, ROMAN |
分类号 |
H01J37/32;H01J37/34 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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