SEMICONDUCTOR FABRICATION APPARATUS USED FOR ASHING PROCESS AND OPERATING METHOD THEREOF

摘要

PURPOSE: A semiconductor fabrication apparatus used for an ashing process and an operating method thereof are provided to perform continuously a semiconductor fabrication process by using two load lock chambers. CONSTITUTION: A wafer loading stage(111) is used for storing a plurality of wafers. The wafers are loaded into a plurality of cassettes(141,142). Each of loadlock chambers(131,132) corresponds to each of the cassettes. A robot(121) draws the wafers from a wafer loading stage by a vacuum absorbing method and loads the wafers into the cassettes. A plurality of heater stages(163-165) are used for performing a semiconductor process for the loaded wafers. A preheating stage(162) is used for preheating the loaded wafers. A buffer stage(161) is used for loading temporarily the wafers. A rotation unit transfers the preheated wafers to the heater stages and transfers the wafers from the heater stages to the buffer stage or the preheating stage. A plurality of transfer units transfers the loaded wafers to the buffer stage or the preheating stage and loads the wafers from the buffer stage or the preheating stage into the cassettes.