发明名称 |
SEMICONDUCTOR MANUFACTURING SYSTEM |
摘要 |
PROBLEM TO BE SOLVED: To improve the processing quality of substrates by sufficiently eliminating water contents in a load lock chamber. SOLUTION: The semiconductor manufacturing system is provided with: a reactor 2; the load lock chamber 1 located side by side to the reactor; a heat means 24 for heating the inner wall face of the load lock chamber; and a dehydrating apparatus 23 communicatively connected to the interior of the load lock chamber, sucking, transmitting and circulating a gas in the load lock chamber, and eliminating water vapor in the inside of the load lock chamber. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2004349518(A) |
申请公布日期 |
2004.12.09 |
申请号 |
JP20030145622 |
申请日期 |
2003.05.23 |
申请人 |
HITACHI KOKUSAI ELECTRIC INC |
发明人 |
MEKAWA YASUHIRO;KAGA YUKINAO |
分类号 |
H01L21/22;H01L21/205;(IPC1-7):H01L21/205 |
主分类号 |
H01L21/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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