发明名称 SEMICONDUCTOR MANUFACTURING SYSTEM
摘要 PROBLEM TO BE SOLVED: To improve the processing quality of substrates by sufficiently eliminating water contents in a load lock chamber. SOLUTION: The semiconductor manufacturing system is provided with: a reactor 2; the load lock chamber 1 located side by side to the reactor; a heat means 24 for heating the inner wall face of the load lock chamber; and a dehydrating apparatus 23 communicatively connected to the interior of the load lock chamber, sucking, transmitting and circulating a gas in the load lock chamber, and eliminating water vapor in the inside of the load lock chamber. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004349518(A) 申请公布日期 2004.12.09
申请号 JP20030145622 申请日期 2003.05.23
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 MEKAWA YASUHIRO;KAGA YUKINAO
分类号 H01L21/22;H01L21/205;(IPC1-7):H01L21/205 主分类号 H01L21/22
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