发明名称 |
APPARATUS AND METHOD FOR FORMING THIN FILM, AND RELEASING DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To form a thin film having excellent flatness by properly releasing a base material from an adhered material obtained by adhering the base material to a substrate by relatively pressing a thin film on the base material to the substrate. SOLUTION: Since a sheet film F is released from the cooled adhered material M after the adhered material M is cooled (cooling step) before the sheet film F is released from the adhered material M, the releasing process can be performed while the state that the adhesiveness of the sheet film F to the thin film is lowered is maintained as it is. As a result, the release of the sheet film F from the adhered material M is facilitated. Since the thin film 121 of the adhered material M is cooled to the degree that the thin film 121 is solidified in the cooling step, excellent releasing performance is obtained. Therefore, the thin film 21 having the excellent flatness can be obtained by properly releasing the sheet film F from the adhered material M. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2004349378(A) |
申请公布日期 |
2004.12.09 |
申请号 |
JP20030143172 |
申请日期 |
2003.05.21 |
申请人 |
DAINIPPON SCREEN MFG CO LTD |
发明人 |
FURUMURA TOMOYUKI;ADACHI HIDEKI;KAMIYAMA TSUTOMU |
分类号 |
H01L21/768;H01L21/31;(IPC1-7):H01L21/31 |
主分类号 |
H01L21/768 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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