| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a device-manufacturing method, in which the coupling of positional parameters with directivity parameters of radiation beam parameters is finally lost, free from having serious effects on parameters owing to the fluctuation of a radiation source. SOLUTION: This lithographic apparatus is provided with the radiation source, a structure for supporting a patterning means, a substrate table for holding a substrate, a projection system for projecting a beam which has carried out pattern formation on a target portion of the substrate, and an illumination system for conditioning a radiation beam. The illumination system is provided with a beam send-out system, provided with a reorientation element to define an entrance plane of the radiation beam in the illumination system, and to reorient and send out a projection beam from the radiation source to the illumination system. The beam send-out system is provided with an image system which images the radiation beam from a target plane, located at a certain distance from the entrance plane to an image plane of the entrance plane or its neighborhood. COPYRIGHT: (C)2005,JPO&NCIPI
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