发明名称 Positive-working resist composition
摘要 A positive-working resist composition comprising (A) a resin that increases solubility in an alkali developing solution by the action of an acid, (B) a compound which generates an acid upon irradiation of an actinic ray or radiation, (C) a nonionic cyclic compound having at least one partial structure represented by the following formula (I) or (II) and at least having either a melting point of 35° C. or more or a boiling point of 100° C./10 mmHg or more: and (D) a solvent.
申请公布号 US2004248035(A1) 申请公布日期 2004.12.09
申请号 US20040863347 申请日期 2004.06.09
申请人 FUJI PHOTO FILM CO., LTD. 发明人 TAKAHASHI HYOU;YAMANAKA TSUKASA;FUJIMORI TORU
分类号 G03F7/004;G03F7/039;(IPC1-7):G03C1/76 主分类号 G03F7/004
代理机构 代理人
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