METHOD FOR MANUFACTURING UNEVEN SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a simple manufacturing method for reducing the size of the texture of a crystal semiconductor substrate having an uneven structure for optical confinement on the surface.

SOLUTION: In the method for manufacturing the uneven substrate for forming the uneven structure by dipping the crystal semiconductor substrate 1 in an alkaline solution containing a surfactant and etching the surface of the substrate, an adhesive 2 is adhered in a dotted manner on the surface of the substrate 1 before dipping the substrate 1 in the alkaline solution.

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