| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithographic projection equipment with a long working distance using a programmable pattern forming means and micro lens array. SOLUTION: The lithography projection apparatus of this invention comprises the micro lens array to generate a plurality of source images in a two dimensional array, the programmable pattern forming means having a plurality of addressable elements that act as shutters for source images, and a projection subsystem to project a source image onto a substrate. Thereby, a larger working distance can be obtained. COPYRIGHT: (C)2005,JPO&NCIPI
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