FILM PATTERN FORMING METHOD, A DEVICE AND A MANUFACTURING METHOD THEREOF, AN ELECTRO-OPTIC DEVICE, AN ELECTRIC APPLIANCE, AND A METHOD FOR MANUFACTURING AN ACTIVE MATRIX SUBSTRATE

摘要

PURPOSE: A film pattern forming method is provided to form a fine film pattern with a good precision and stability, thereby capable of manufacturing an active matrix substrate with a desired performance. CONSTITUTION: A function solution(L) is arranged at a partition region(A) partitioned by a bank(B). The function solution(L) is dried, so that a film pattern(C) is formed on a substrate(P). After forming the film pattern(C), the bank(B) is removed or remained. A droplet of the function solution(L) is repeatedly dropped on the substrate(P) with a predetermined pitch(a drop pitch(h)). The drop position of the droplet at the end of the partition region, is below half of that from the end of the region.