WATER-SOLUBLE NEGATIVE PHOTORESIST

摘要

PROBLEM TO BE SOLVED: To provide optimum use of a photoresist coating for packing-and-unpacking processing steps of photoresist exposure.

SOLUTION: In use of a photoresist for producing closely spaced contact holes, the surface of a first photoresist layer is exposed through a first mask including first and second patterns of contact holes; in accordance with the first and second patterns of contact holes, openings are formed in the first photoresist layer; a second negative photoresist layer is deposited on the surface of the first photoresist layer; and in accordance with the second pattern of contact holes, openings are formed in the second photoresist layer.

COPYRIGHT: (C)2005,JPO&NCIPI