发明名称 PHOTOSENSITIVE MATERIAL PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To process a photosensitive material of a relatively small size as well as to miniaturize the whole processing tank, by a system of loading racks each constituting a plurality of processing chambers aligned in a transport direction in unit tanks. SOLUTION: Within processing solution storing unit tanks 10A, 10B of a photosensitive material processing apparatus, a stepped part 30 (32, 34, 36, 38, 40) for partition is formed in an inwardly protruding slant shape on a part of each inner wall of the unit tanks 10A, 10B corresponding to the boundary, e.g., between a processing chamber 16 having a larger cross sectional area and a processing chamber 18 having a smaller cross sectional area just under the chamber 16. Racks 14A, 14B loaded in the unit tanks 10A, 10B are equipped with partition members 48, 50, 52 with partition substrates 54 for partition between processing chambers in such a way that a photosensitive material A can pass while the circulation of a processing solution is prevented, and each sealing member 62 which prevents the circulation of a processing solution is disposed by pressure-welding the front edge to the stepped part 30 for partition in such a way as to surround the periphery of the partition substrate 54. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004347922(A) 申请公布日期 2004.12.09
申请号 JP20030145925 申请日期 2003.05.23
申请人 FUJI PHOTO FILM CO LTD 发明人 HYODO TOMOYOSHI;TANAKA KATSUHIKO
分类号 G03D3/08;(IPC1-7):G03D3/08 主分类号 G03D3/08
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