| 摘要 |
PROBLEM TO BE SOLVED: To provide an ion-assisted vapor deposition apparatus which is capable of manufacturing a high-quality narrow band pass filter and which is in the size almost equal to a conventional apparatus and does not require many correction boards, and to provide a method therefor. SOLUTION: An ion-assisted vapor deposition apparatus 100 is equipped with: a vacuum chamber A which can keep the inside in a substantially vacuum state; a vapor source which vaporizes a vaporization material inside the vacuum chamber; and a substrate holder 10a which holds a disk substrate 8 while rotating the substrate where a thin film is to be deposited by depositing the vaporization material vaporized from the vaporization source. In this apparatus, deformable correction boards 23a, 23b are disposed to correct the distribution of the thickness of the thin film in the radial direction of the substrate. COPYRIGHT: (C)2005,JPO&NCIPI
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