发明名称 SUBSTRATE TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To improve the workability and safety of the operation for recovering a liquid raw material pooled in a pooling vessel without decreasing the rate of operation. SOLUTION: An apparatus is equipped with a reaction chamber 5 wherein a substrate is treated, an exhaust pipe 7 through which exhaust gas is exhausted from the reaction chamber, a collecting means 38 which is installed in the exhaust pipe to perform phase transition of the raw material contained in the exhaust gas and collect the raw material and the pooling vessel 13 which communicates with the collecting means and recovers the liquid raw material collected by the collecting means. Here, the pooling vessel can be detached from the collecting means. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004346378(A) 申请公布日期 2004.12.09
申请号 JP20030145287 申请日期 2003.05.22
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 SANO ATSUSHI;WADA TETSUYA
分类号 C23C16/44;H01L21/31;(IPC1-7):C23C16/44 主分类号 C23C16/44
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