发明名称 |
SUBSTRATE TREATMENT APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To improve the workability and safety of the operation for recovering a liquid raw material pooled in a pooling vessel without decreasing the rate of operation. SOLUTION: An apparatus is equipped with a reaction chamber 5 wherein a substrate is treated, an exhaust pipe 7 through which exhaust gas is exhausted from the reaction chamber, a collecting means 38 which is installed in the exhaust pipe to perform phase transition of the raw material contained in the exhaust gas and collect the raw material and the pooling vessel 13 which communicates with the collecting means and recovers the liquid raw material collected by the collecting means. Here, the pooling vessel can be detached from the collecting means. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2004346378(A) |
申请公布日期 |
2004.12.09 |
申请号 |
JP20030145287 |
申请日期 |
2003.05.22 |
申请人 |
HITACHI KOKUSAI ELECTRIC INC |
发明人 |
SANO ATSUSHI;WADA TETSUYA |
分类号 |
C23C16/44;H01L21/31;(IPC1-7):C23C16/44 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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