发明名称 Pretreated gas distribution plate
摘要 A gas distribution plate (GDP) GDP is pretreated before implementation in a semiconductor fabrication apparatus so as to be stable over the operational lifetime of the GDP. The pre-treatment acts to reduce undesired reactions of the GDP with process chemistry used in the semiconductor fabrication apparatus. The pre-treatment is applied to at least a portion of the gas distribution plate. Preferably, surfaces of the gas distribution plate which come in contact with the process chemistry are pretreated.
申请公布号 US2004244685(A1) 申请公布日期 2004.12.09
申请号 US20040882484 申请日期 2004.06.30
申请人 LAM RESEARCH CORPORATION 发明人 RICCI ANTHONY J.;KADKHODAYAN BABAK
分类号 H05H1/46;H01J37/32;H01L21/3065;(IPC1-7):C23C16/00 主分类号 H05H1/46
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