发明名称 |
Pretreated gas distribution plate |
摘要 |
A gas distribution plate (GDP) GDP is pretreated before implementation in a semiconductor fabrication apparatus so as to be stable over the operational lifetime of the GDP. The pre-treatment acts to reduce undesired reactions of the GDP with process chemistry used in the semiconductor fabrication apparatus. The pre-treatment is applied to at least a portion of the gas distribution plate. Preferably, surfaces of the gas distribution plate which come in contact with the process chemistry are pretreated.
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申请公布号 |
US2004244685(A1) |
申请公布日期 |
2004.12.09 |
申请号 |
US20040882484 |
申请日期 |
2004.06.30 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
RICCI ANTHONY J.;KADKHODAYAN BABAK |
分类号 |
H05H1/46;H01J37/32;H01L21/3065;(IPC1-7):C23C16/00 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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