| 摘要 |
PROBLEM TO BE SOLVED: To provide an electrostatic chuck with which uniform treatment can be performed on the whole surface of a wafer, glass substrate, etc., by making the track of the primary particle of, for example, an electron beam exposure system etc., using an ion in plasma or the ion used in the conventional ion implantation and an electron having a smaller mass than the ion has hardly affected by the impressing voltage of the chuck, by increasing the attracting force of the chuck with a low voltage. SOLUTION: For solving the problem, the substantial attracting force of the electrostatic chuck is increased by using a macromolecular resin material, such as the polyimide etc., to the surface of the chuck for maintaining a plasma resistance, and providing a ferroelectric ceramic layer having a very high specific inductive capacity immediately under the macromolecular resin material. Simultaneously, the leakage of electric fields to the circumference around the chuck is reduced by forming bipolar electrodes in the chuck. COPYRIGHT: (C)2005,JPO&NCIPI |
