发明名称 |
Method for concurrently producing at least a pair of semiconductor structures that each include at least one useful layer on a substrate |
摘要 |
A method for concurrently producing at least a pair of semiconductor structures that each include at least one useful layer on a substrate. The method includes providing an initial structure that includes a useful layer having a front face on a support substrate. Atomic species are implanted into the useful layer to a controlled mean implantation depth to form a zone of weakness within the useful layer that defines first and second useful layers. Next, a stiffening substrate is bonded to the front face of the initial structure. The first useful layer is then detached from the second useful layer along the zone of weakness to obtain a pair of semiconductor structures with a first structure including the stiffening substrate and the first useful layer and a second structure including the support substrate and the second useful layer. The structures obtained can be used in the fields of electronics, optoelectronics or optics.
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申请公布号 |
US2004248378(A1) |
申请公布日期 |
2004.12.09 |
申请号 |
US20030686084 |
申请日期 |
2003.10.14 |
申请人 |
GHYSELEN BRUNO;AULNETTE CECILE;BATAILLOU BENOIT;MAZURE CARLOS;MORICEAU HUBERT |
发明人 |
GHYSELEN BRUNO;AULNETTE CECILE;BATAILLOU BENOIT;MAZURE CARLOS;MORICEAU HUBERT |
分类号 |
H01L21/762;(IPC1-7):C30B1/00;H01L21/20;H01L21/36;H01L21/30;H01L21/46 |
主分类号 |
H01L21/762 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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