发明名称 |
DEEP ULTRAVIOLET UNIT-MAGNIFICATION PROJECTION OPTICAL SYSTEM AND PROJECTION EXPOSURE APPARATUS |
摘要 |
<p>A 1X projection optical system for deep ultra-violet (DUV) photolithography is disclosed. The optical system is a modified Dyson system capable of imaging a relatively large field at high numerical apertures at DUV wavelengths. The optical system includes a lens group having first and second prisms and four lenses having a positive-negative-positive negative arrangement as arranged in order from the prisms toward the mirror. A projection photolithography system that employs the projection optical system of the invention is also disclosed.</p> |
申请公布号 |
WO2004107037(A1) |
申请公布日期 |
2004.12.09 |
申请号 |
WO2004US16389 |
申请日期 |
2004.05.24 |
申请人 |
ULTRATECH, INC. |
发明人 |
MERCADO, ROMEO, I.;ZHANG, SHIYU |
分类号 |
G02B13/14;G02B17/00;G02B17/08;G02B27/28;G03B21/14;G03B27/54;G03F7/20;H04B10/00;(IPC1-7):G03B21/14 |
主分类号 |
G02B13/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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