PHOTOMASK, INSPECTION METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a photomask for inspecting the birefringence of a projection lens.

SOLUTION: The photomask is provided with: a transparent substrate 10; a pattern of a light shielding film 11 having a window part and formed on the surface of the transparent substrate 10; a first inspection pattern 13 disposed in the window part and polarizing illumination light into a first polarized state; and a second inspection pattern 14 disposed so as to be separated from the first inspection pattern 13 by a fixed distance in the window part and polarizing the illumination light into a second polarized state different from the first polarized state.

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