| 摘要 |
PROBLEM TO BE SOLVED: To provide a new work stage of a proximity exposure apparatus having a fast elevating speed and inducing no distortion in a substrate held on the stage. SOLUTION: A work chuck 110 holding a substrate W and the stage base 120 are connected with at least one crank 130, and the crank 130 is rotated by a moving mechanism 140 to move up and down the work chuck 110 with respect to the stage base 120. Thereby, the work chuck 110 can be rapidly moved up or down, and a stopper or a shock absorber is made unnecessary, which definitely prevents distortion in the substrate W by shocks. COPYRIGHT: (C)2005,JPO&NCIPI |
