| 摘要 |
PROBLEM TO BE SOLVED: To dissolve the difference in specific resistance between a specific resistance value on the device side directly after a gaseous CO<SB>2</SB>injection point and a specific resistance value in a use point slightly far therefrom in a method where gaseous CO<SB>2</SB>is injected to ultrapure water or pure water used in the production process of semiconductors or liquid crystals for the purpose of preventing electrification. SOLUTION: In the electrification prevention device, a non-power ion dissociation means such as a static mixer is installed in the downstream of an injection point of gaseous CO<SB>2</SB>for promoting the ion dissociation (H<SP>+</SP>, HCO<SB>3</SB><SP>-</SP>) of dissolved H<SB>2</SB>CO<SB>3</SB>components dissolved into ultrapure water or pure water. COPYRIGHT: (C)2005,JPO&NCIPI
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