发明名称 |
Substrate for photomask, photomask blank and photomask |
摘要 |
A substrate for photomask has a top surface and a back surface, the substrate being square in shape, an end surface formed along the thickness thereof and a chamfered surface formed on a perimeter edge region where the end surface and the top surface meet and another region where the end surface and the back surface meet, a size of the perimeter edge of the substrate is 300 mm or more on a side and the end surface and the chamfered surface each has a roughened surface having a surface roughness (Ra) ranging from 0.03 mum to 0.3 mum.
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申请公布号 |
US2004248017(A1) |
申请公布日期 |
2004.12.09 |
申请号 |
US20040808540 |
申请日期 |
2004.03.25 |
申请人 |
HOYA CORPORATION |
发明人 |
OHTAGURO RYU;HASHIGUCHI KOICHI |
分类号 |
H01L21/027;C03C19/00;C03C23/00;G03F1/00;G03F1/14;G03F7/20;G03F9/00;H01L21/00;(IPC1-7):G03F9/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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