CHEMICALLY AMPLIFYING PHOTORESIST LAYER LAMINATE, METHOD FOR MANUFACTURING PHOTORESIST LAYER LAMINATE, METHOD FOR MANUFACTURING PHOTORESIST PATTERN AND METHOD FOR MANUFACTURING CONNECTING TERMINAL

摘要

PROBLEM TO BE SOLVED: To provide a stable chemically amplifying photoresist layer laminate which does not change its alkali solubility before irradiation with radiation, to provide a method for manufacturing a photoresist pattern by using the laminate, and to provide a method for manufacturing a connecting terminal.

SOLUTION: The photoresist laminate is obtained by laminating on a supporting body: (a) a resin which changes its alkali solubility by an acid; and (b) a photoresist layer comprising a chemically amplifying photoresist composition containing a compound which generates an acid by being irradiated with radiation. Copper is used for at least a part of the upper face side of the supporting body, and a copper oxide film is formed on the surface of the copper.

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