发明名称 |
METHOD FOR FORMING TRANSPARENT THIN FILM, TRANSPARENT THIN FILM FORMED BY THE METHOD AND TRANSPARENT SUBSTRATE WITH TRANSPARENT THIN FILM |
摘要 |
<p>The present invention provides a method for forming a transparent thin film by a chemical vapor deposition method using a gaseous raw material. In the method, a film growth rate is at least 8 nm/s, and the transparent thin film contains at least one selected from carbon (C) and oxygen (O), nitrogen (N), hydrogen (H), and silicon (Si). According to this method, a transparent thin film that does not peel off a substrate easily due to the eased tension in the thin film and has high transmittance in the visible light region can be deposited on a glass ribbon in a float bath. <IMAGE></p> |
申请公布号 |
EP1484293(A1) |
申请公布日期 |
2004.12.08 |
申请号 |
EP20030703110 |
申请日期 |
2003.01.31 |
申请人 |
NIPPON SHEET GLASS COMPANY, LIMITED |
发明人 |
OTANI, TSUYOSHI;HIRATA, MASAHIRO |
分类号 |
C03C17/22;C03C17/245;C03C17/34;C23C16/34;(IPC1-7):C03C17/22 |
主分类号 |
C03C17/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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