PHOTORESIST COMPOSITION SUPPLY APPARATUS WITH BUBBLE EXHAUSTING UNIT

摘要

PURPOSE: A photoresist composition supply apparatus is provided to improve uniformity of a photoresist layer by using a bubble exhausting unit. CONSTITUTION: A photoresist composition supply apparatus comprises a container(202) for storing a photoresist composition, a buffer tank(204) for receiving the photoresist composition from the container, and a photoresist composition supply unit(230) for supplying the photoresist composition in the buffer tank to a semiconductor substrate. A bubble detection sensor(206) for detecting the bubbles in the photoresist composition is installed on the buffer tank. The buffer tank is connected to a bubble exhaust unit(220) which exhausts the photoresist composition including bubbles from the buffer tank in case of a detection of the bubbles.