LITHOGRAPHIC PROJECTION APPARATUS FOR REDUCING DEGRADATION OF PHOTORESIST FORMED ON SURFACE OF SUBSTRATE IN IMMERSING PROCESS AND EXPOSURE PROCESS, AND METHOD FOR FABRICATING DEVICE THEREOF

摘要

PURPOSE: A lithographic projection apparatus for reducing degradation of photoresist formed on a surface of a substrate in an immersing process and an exposure process and method for fabricating a device thereof are provided to avoid the degradation of the photoresist from the surface of the substrate irrespective of partial immersion of the surface of the substrate. CONSTITUTION: A radiation system provides a projection beam of radiation. A support structure is used for supporting a patterning unit. The patterning unit serves to pattern the projection beam according to a desired pattern. A substrate table is used for holding a substrate. A projection system projects the patterned beam onto a target of the substrate. A liquid supply system fills the space between the final element of the projection system and the substrate with a liquid. The liquid is an aqueous solution having a pH of less than 7.