| 摘要 |
PURPOSE: Provided are an exposure apparatus that can expose an image of a desired shape(or pattern) at a desired magnification, and a method for manufacturing a device using the exposure apparatus. CONSTITUTION: The exposure apparatus includes an illumination optical system(20) for illuminating a pattern on an object by light supplied from a light source(10); a projection optical system(30) for projecting onto a substrate an image of the pattern illuminated by the illumination optical system(20), which comprises a mirror; and a detection system for detecting a positional offset of the image of pattern. The device is manufactured by employing the exposure apparatus, and specifically by the method comprising the steps of: applying resist onto a substrate; exposing a pattern on a mask onto the applied substrate with the exposure apparatus; and developing the exposed substrate.
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