首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
DEVICE AND METHOD FOR ANISOTROPICALLY PLASMA ETCHING A SUBSTRATE
摘要
申请公布号
EP1483780(A2)
申请公布日期
2004.12.08
申请号
EP20030722207
申请日期
2003.03.05
申请人
ROBERT BOSCH GMBH
发明人
LAERMER, FRANZ;BREITSCHWERDT, KLAUS;KUTSCH, BERND
分类号
H01L21/00;(IPC1-7):H01L21/00
主分类号
H01L21/00
代理机构
代理人
主权项
地址
您可能感兴趣的专利
BGL3 beta-glucosidase and nucleic acids encoding the same
Ball grid array X-ray orientation mark
Semiconductor memory device adaptable to various types of packages
Thong sanitary napkin with self folding flaps
COMPOSITIONS FOR TOPICAL APPLICATION HAVING ANDREGENIC ACTIONS
HIV inhibiting pyrimidine derivatives
Under tissue conditions degradable material and a method for its manufacturing
Tissue treatment device for an extremity
Flood gate for door
Recording apparatus
Balanced sense amplifier control for open digit line architecture memory devices
Polling using multiple dynamically updated lists
IN-PLANE-SWITCHING LIQUID CRYSTAL DISPLAY UNIT HAVING TINTING COMPENSATION
Lockout for reset mechanism of electrical protective device
Probe contact system having planarity adjustment mechanism
SETTABLE COMPOSITION CONTAINING POTASSIUM CHLORIDE
POWER DELIVERY SYSTEM FOR INTEGRATED CIRCUITS UTILIZING DISCRETE CAPACITORS
High density arrays
Dual input AC and DC power supply having a programmable DC output utilizing single-loop optical feedback
Field emission type cold cathode and method for manufacturing the same and method for manufacturing flat display
