发明名称 Cerium oxide slurry, and method of manufacturing substrate
摘要 A problem to be solved is to provide a slurry that is capable of flattening an uneven film on a substrate with good precision, and that has good stability, not separating into two layers, solidifying through flocculated settling or undergoing changes in viscosity. This problem is solved by adding poly ammonium acrylates having different degrees of neutralization to one another as surfactants to a cerium oxide slurry containing cerium oxide particles, and suitably adjusting the total amount of polyacrylates added.
申请公布号 US6827752(B2) 申请公布日期 2004.12.07
申请号 US20030333643 申请日期 2003.03.12
申请人 EKC TECHNOLOGY K.K. 发明人 NOJO HARUKI;YOSHIDA AKITOSHI;BERAR PASCAL
分类号 B24B37/00;C09G1/02;C09K3/14;H01L21/304;H01L21/306;H01L21/3105;(IPC1-7):C09G1/02;C09G1/04 主分类号 B24B37/00
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