发明名称 Precision electroplated solder bumps and method for manufacturing thereof
摘要 A solder bump structure for use on a substrate. The solder bump structure includes a multilayer underbump metallization having a major upper surface with a solder wetable caplayer for contacting a solder bump, the mutilayer underbump metallization projecting from the substrate with an exposed sidewall; a thin layer of a metal selected from a group consisting of titanium, chrome, a titanium-nickel-titanium composite, a titanium-nickel-chrome composite, a titanium-platinum-titanium alloy, and a titanium-nickel-oxidized silicon composite deposited over or under the multilayer underbump metallization and covering the exposed sidewall of the multilayer underbump metallization.
申请公布号 US6828677(B2) 申请公布日期 2004.12.07
申请号 US20020053159 申请日期 2002.01.15
申请人 HRL LABORATORIES, LLC. 发明人 YAP DANIEL;LAWYER PHILIP H.
分类号 H01L21/60;H01L23/485;H05K3/34;(IPC1-7):H01L23/48 主分类号 H01L21/60
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