| 发明名称 |
Silica glass having superior durability against excimer laser beams and method for manufacturing the same |
| 摘要 |
<p>A silica glass is provided for use in an optical system processing an excimer laser beam. The silica glass has a molecular hydrogen concentration of about 5 x 10<18> molecules/cm<3> or less and is substantially free from defects which become precursors susceptible to an one-photon absorption process and a two-photon absorption process upon irradiation of the excimer laser beam to the silica glass. <IMAGE></p> |
| 申请公布号 |
EP0921104(A1) |
申请公布日期 |
1999.06.09 |
| 申请号 |
EP19980118575 |
申请日期 |
1998.10.01 |
| 申请人 |
NIKON CORPORATION |
发明人 |
JINBO, HIROKI;KOMINE, NORIO;FUJIWARA, SEISHI;YOSHIDA, AKIKO |
| 分类号 |
C03B19/14;C03B32/00;C03C3/06;(IPC1-7):C03C3/06;C03B19/10 |
主分类号 |
C03B19/14 |
| 代理机构 |
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| 主权项 |
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| 地址 |
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